CVD Chamber Cleaning and Etching with Octafluoropropane
Also known as Flutec PP30, perfluoropropane, R218 or just 218, octafluoropropane is used extensively by the semi-conductor industry in etching processes and chemical vapour deposition (CVD) chamber cleaning to remove dielectric film build up.
It is an ideal medium. In a plasma with oxygen, it generates a variety of reactive species that breakdown chemical deposits to make volatile products, which are readily removed under vacuum. Its cleaning effect is comparable to that of C2F6, but with significantly lower gas usage (up to 50%), offering important economic and environmental advantages.